High vacuum thin film deposition equipment.
![High vacuum thin film deposition equipment.](/sites/default/files/2017-10/Camera_vuoto_01.jpg)
Design and manufacturing of a high vacuum chamber, including impeller, rotors, diffusion pumps and an automatic control panel. It is able to achieve, as request by the customer, a vacuum of 10-4 mbar in 20 minutes. This chamber is equipped with a DN800 valve for the interseption of the diffusion pump.